Molybdenum Niobium alloy sputtering target
We offer high purity Mo-Nb sputtering target for Physical Vapor Deposition coating.
Choosing high purity Molybdenum powder and Niobium powder, after hours of mixing in our V-shape mixing machine, well mixed alloy powder is achieved. Then fill the alloy powder into a model for cold iso-static pressing. Through sintering process, we achive the billet for making Molybdenum Niobium Mo-Nb alloy sputtering target.
After milling, surface treatment, cleaning and inspection, a perfect planar or cylinderical / rotatable Molybdenum-Niobium sputtering is gonna be delivered to you.
Planar Molybdenum Niobium alloy sputtering target
Coefficient of thermal expansion
Single phase, without oxide
Properties of our Molybdenum niobium (Mo10Nb) sputtering targets and other Molybdenum alloy targets
- High density, to enable higher sputtering rates and higher quality film
- Corrosion resistance
- Low electrical resistance
- Great consistency
- High temperature resistance
Baoji Kedipu New Material Co., Ltd
Factory Address: No.29, Taicheng Road, Weibin District, Baoji City, Shaanxi, China
Office Address: No. 1004, Building C, Greenland City Gate, Xi'an City, Shaanxi, China
Tel/Fax: +86-029- 8110 5213
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